Atomic Films Laboratory
To gain fundamental insights into the surface chemical reactions
during the nucleation and growth of thin films by atomic layer
deposition (ALD), we develop and employ a number of experimental
approaches and instrumentation. The instrumentation described below
helps us understand what is happening during ALD (called in situ
process characterization) or after ALD (called ex situ film
characterization). We also use shared user facilities at Boise State
and national user facilities.
Facilities
See the ALD and SPM pages for further details and information.
- Custom tube furnace based ALD system
- Arradiance GEMStarXT ALD system (open access)
- Omicron/RHK UHV STM
- Hitachi TM-1000 benchtop SEM (under repair)
- PHI 5600 ESCA X-ray photoelectron spectroscopy (XPS) system (open access)
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- Sputter depth profiling with Ar, Ne, or Xe
- Sealed sample transfer vessel (e.g., glovebox to XPS load-lock)
- Samples up to ~100 mm in diameter
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- Nicolet Magna 550 FTIR (open access)
- Inficon Transpector MPH Compact Process Monitor (open access)
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- 200 amu quadrupole mass spectrometer
- Process bypass line
- Selectable inlet orifice
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- J.A. Woollam M-2000 Spectroscopic Ellipsometer (open access)
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- 245-1690 nm, 660 wavelengths
- Auto tip-tilt 100 mm x 100 mm scanning stage
- Focusing optics (120 micron spot)
- Access and training managed by
the Idaho Microfabrication Lab
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Please feel free to contact me.
