Collage of images related to ALD research

Atomic Films Laboratory

To gain fundamental insights into the surface chemical reactions during the nucleation and growth of thin films by atomic layer deposition (ALD), we develop and employ a number of experimental approaches and instrumentation. The instrumentation described below helps us understand what is happening during ALD (called in situ process characterization) or after ALD (called ex situ film characterization). We also use shared user facilities at Boise State and national user facilities.


See the ALD and SPM pages for further details and information.

Please feel free to contact me.